Method of thin film thickness measurement based on laser heterodyne interferometry

SHI Kai; SU Junhong; QI Yuan

doi:10.5768/JAO201940.0303003

Volume 40 Issue 3

May 2019

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SHI Kai, SU Junhong, QI Yuan. Method of thin film thickness measurement based on laser heterodyne interferometry[J]. Journal of Applied Optics, 2019, 40(3): 473-477. doi: 10.5768/JAO201940.0303003

Citation:

SHI Kai, SU Junhong, QI Yuan. Method of thin film thickness measurement based on laser heterodyne interferometry[J]. Journal of Applied Optics, 2019, 40(3): 473-477. doi: 10.5768/JAO201940.0303003

SHI Kai, SU Junhong, QI Yuan. Method of thin film thickness measurement based on laser heterodyne interferometry[J]. Journal of Applied Optics, 2019, 40(3): 473-477. doi: 10.5768/JAO201940.0303003

Citation:

SHI Kai, SU Junhong, QI Yuan. Method of thin film thickness measurement based on laser heterodyne interferometry[J]. Journal of Applied Optics, 2019, 40(3): 473-477. doi: 10.5768/JAO201940.0303003

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Method of thin film thickness measurement based on laser heterodyne interferometry

doi: 10.5768/JAO201940.0303003

SHI Kai^{1, 2
,},
SU Junhong^{1, 2},
QI Yuan³

1.
School of Optoelectronic Engineering, Xi'an Technological University, Xi'an 710021, China
2.
Shaanxi Key Laboratory of Photoelectricity Measurement and Instrument Technology, Xi'an Technological University, Xi'an 710021, China
3.
Xi'an Institute of Applied Opitcs, Xi'an 710065, China

Received Date: 2018-10-17
Rev Recd Date: 2018-12-06
Publish Date: 2019-05-01

Abstract

Abstract

For the difficulty of measuring the thin film thickness, a method of thin film thickness measurement based on laser heterodyne interferometry was proposed. Using the classical Michelson interference optical path, the heterodyne interference principle was used to convert the film thickness difference into the optical path difference, and the precise displacement table was used as the scanning mechanism to realize the progressive scanning measurement of the film thickness. Results show that the shift of the measurement system within 20 min under constant temperature experimental conditions does not exceed 8 nm, and the average deviation of the measurement results is less than 1 nm. Comparing with the measurement results of the ellipsometer, the measurement difference is 12.97 nm, indicating the feasibility of the method.
- laser interferometry,
- heterodyne,
- thin film thickness,
- measurement

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References(16)

References

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