基于双弹光的椭偏参量稳定测量系统设计

Design of ellipsometry parametric stable measurement system based on double-elastic light

  • 摘要: 针对高精度、高重复性、快速实时的椭偏测量需求,研究了一种基于双弹光椭偏参量的稳定测量技术。对弹光调制型椭偏参量测量系统进行原理介绍,设计了一种椭偏参量稳定测量系统。利用多速率处理方法(即降采样方法),在减少现场可编程门阵列(FPGA)硬件资源使用的同时,能够达到窄带低通滤波的效果。对降采样中使用的CIC滤波器与FIR滤波器进行设计,采用数字锁相技术对双弹光调制光载波信号进行解调,获得椭偏参量的初始信息。随后设计了实验系统,并对已标定的Si基SiO2标准样品进行2 000次的测量验证。实验结果表明,将采样时间设置为20 ms时,椭偏参量幅值比和相位差的重复性精度均优于0.001°,测量样品的薄膜厚度重复性精度为0.001 nm,验证了该设计具有较好的测量重复性和较高的测量精度。

     

    Abstract: For the needs of high precision, high repeatability and fast real-time ellipsometry measurement, a stable ellipsometry measurement technique based on double elastic ellipsometry parameters was studied. The principle of the elastic modulation ellipsometry parameter measurement system was introduced, and a stable ellipsometry parameter measurement system was designed. The multi-rate processing method (downsampling method) could achieve the effect of narrowband low-pass filtering while reducing the utilization of field programmable gate array (FPGA) hardware resources. The CIC and FIR filters used in downsampling were designed, the digital phase-lock technique was used to demodulate the double-elastic modulated optical carrier signal, and the initial ellipsometry parameters were obtained. The experimental system was designed and the calibrated Si-based SiO2 standard sample was tested for 2 000 times. The experimental results show that when the sampling time is set to 20 ms, the repeatability accuracy of amplitude ratio and phase difference is better than 0.001°, and the repeatability accuracy of film thickness of the measured sample is 0.001 nm, which verifies that the design has better measurement repeatability and higher measurement accuracy.

     

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