介绍了一种多光束无掩模光刻系统，该系统利用空间光调制器数字微反射镜(DMD)对405nm的激光光束进行调制，控制波带片阵列及纳米透镜阵列聚焦，利用聚焦点阵配合纳米移动平台进行扫描光刻。介绍了该无掩模光刻实验系统结构及工作原理，并给出了多光束光刻的实验结果。实验表明：利用普通蓝紫光源和聚焦元件阵列可实现分辨率为400nm的多光束并行光刻。

A multi-beam lithograph system is introduced. The system uses a digital micro-mirror device (DMD) as a spatial light modulator to modulate the 405nm laser. By controlling the zone-plate-array or focusing-element-array to focus on the substrate to form a focusing-lattice, scanning lithograph is achieved with a nanometer moving platform. The setup and principle of the system is introduced and the result of the experiments is given. The experiment proved that multi-beam lithography with resolution of 400nm is achieved using the ordinary blue light and focusing-element-array.

［1］SMITH H I. A proposal for maskless, zone-plate-array nanolithography［J］. Journal of Vacuum Sciences and Technology B,1996,14(6):4318-4322.
［2］DJOMEHRI I J, SAVAS T A, SMITH H I. Zone-plate-array lithography in the deep ultraviolet［J］. Journal of Vacuum Sciences and Technology B,1998,16(6):3426-3429.
［3］CARTER D J D,GIL D,MENON R,et al. Mask-less,parallel patterning with zone-plate array lithography［J］. Journal of Vacuum Sciences and Technology B,1999,17(6):3449-3452.
［4］MENON R, PATEL A, MOON E E, et al. Alpha-prototype system for zone-plate-array lithography［J］. Journal of Vacuum Sciences and Technology B,2004, 22(6):3032-3037.
［5］CHAO D,PATEL A,BARWICZ T,et al.Immer-sion zone-plate-array lithography［J］. Journal of Vacuum Sciences and Technology B,2005,23(6):26572661.
［6］CARTER D J D, GIL D, MENON R, et al. Zone-plate array lithography(ZPAL): A new maskless approach［J］. SPIE,1999, 3676:324-332.
［7］彭钦军，郭永康,陈波，等.液晶实时掩膜技术制作连续微光学元［J］.光学学报,2003，23(2)：220-224.
PENG Qin-jun, GUO Yong-kang, CHEN Bo，et al. LCD realtime mask technique for fabrication of continuous micro-optical elements［J］. Acta Optica Sinica,2003,23(2):220-224. (in Chinese with an English abstract)
［8］陈劲松.基于数字微镜的高质量精缩投影光刻系统的研制［J］.激光与红外,2006,36(3):206-209.
CHEN Jin-song. Research on high quality reduction projecting system based on digital micromirror device［J］.Laser & Infrared, 2006,36(3):206-209.(in Chinese with an English abstract)
［9］SRITURAVANICH W, PAN Liang, WANG Yuan, et al. Flying plasmonic lens in the near field for high-speed nanolithography［J］. Nature Nanotechnology,2008,3:733-737.
［10］MENON R, GIL D, BARBASTATHIS G, et al. Photon-sieve lithography［J］. J.Opt.Soc.Am.A.,2005,22(2):342-345.
［11］KIPP L, SKIBOWSKI M, JOHNSON R L, et al. Sharper images by focusing soft Xrays with photon sieves［J］. Nature,2001,414:184-188.